Levinson, Harry J.: search on Z-Library

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1

Reciprocation: The Relationship between Man and Organization

Journal:

Administrative Science Quarterly

Year:

1965

Language:

english

File:

PDF, 1.92 MB

english, 1965

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Proposal for determining exposure latitude requirements

Levinson, Harry J., Ma, Yuansheng, Koenig, Marcel, La Fontaine, Bruno, Seltmann, Rolf

Year:

2008

Language:

english

File:

PDF, 371 KB

english, 2008

3

Organizational Diagnosis.

Pfeffer, Jeffrey, Levinson, Harry

Journal:

Contemporary Sociology: A Journal of Reviews

Year:

1973

Language:

english

File:

PDF, 398 KB

english, 1973

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Separating the optical contributions to line-edge roughness in EUV lithography using stochastic simulations

Hohle, Christoph K., Gronheid, Roel, Chunder, Anindarupa, Latypov, Azat, Chen, Yulu, Biafore, John J., Levinson, Harry J., Bailey, Todd

Year:

2017

Language:

english

File:

PDF, 428 KB

english, 2017

5

Special Issue on Professionals in Organizations || Organizational Stress: Studies in Role Conflict and Ambiguity.by Robert L. Kahn; Donald M. Wolfe; Robert P. Quinn; J. Diedrick Snoek; Robert A. Rosenthal

Review by: Harry Levinson

Journal:

Administrative Science Quarterly

Year:

1965

Language:

english

File:

PDF, 555 KB

english, 1965

6

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Mask optimization for arbitrary patterns with 2D-TCC resolution enhancement technique

Kawashima, Miyoko, Yamazoe, Kenji, Sekine, Yoshiyuki, Hakko, Manabu, Ohta, Masakatsu, Honda, Tokuyuki, Levinson, Harry J., Dusa, Mircea V.

Year:

2008

Language:

english

File:

PDF, 1.36 MB

english, 2008

7

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - 22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

Bencher, Chris, Chen, Yongmei, Dai, Huixiong, Montgomery, Warren, Huli, Lior, Levinson, Harry J., Dusa, Mircea V.

Year:

2008

Language:

english

File:

PDF, 403 KB

english, 2008

8

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Characterization of photo-acid redeposition in 193-nm photoresists

Wallow, Thomas, Lin, Qinghuang, Plat, Marina, Zhang, Zhanping, MacDonald, Brian, Bernard, Joffre, Romero, Jeremias, La Fontaine, Bruno, Levinson, Harry J.

Year:

2007

Language:

english

File:

PDF, 910 KB

english, 2007

9

Directed self-assembly compliant flow with immersion lithography: from material to design and patterning

Ma, Yuansheng, Wang, Yan, Word, James, Lei, Junjiang, Mitra, Joydeep, Torres, Juan Andres, Hong, Le, Fenger, Germain, Khaira, Daman, Preil, Moshe, Kye, Jongwook, Levinson, Harry J.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 4.76 MB

english, 2016

10

Extreme ultraviolet lithography’s path to manufacturing

Levinson, Harry J.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2009

Language:

english

File:

PDF, 466 KB

english, 2009

11

The changing psychoanalytic organization and its influence on the ego ideal of psychoanalysis.

Levinson, Harry

Journal:

Psychoanalytic Psychology

Year:

1994

Language:

english

File:

PDF, 1.16 MB

english, 1994

12

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Fitness and runtime correlation of compact model complexity

Drozdov, Alexander N., Kempsell, Monica L., Granik, Yuri, Levinson, Harry J., Dusa, Mircea V.

Year:

2008

Language:

english

File:

PDF, 255 KB

english, 2008

13

Executive dilemmas: Coaching and the professional perspectives of Harry Levinson.

Kilburg, Richard R., Levinson, Harry

Journal:

Consulting Psychology Journal: Practice and Research

Year:

2008

Language:

english

File:

PDF, 105 KB

english, 2008

14

Errata: Extreme ultraviolet lithography's path to manufacturing

Levinson, Harry J.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2010

Language:

english

File:

PDF, 51 KB

english, 2010

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Optical Microlithography XXII - Advanced self-aligned double patterning development for sub-30-nm DRAM manufacturing

Shiu, Weicheng, Liu, Hung Jen, Wu, Jan Shiun, Tseng, Tsu-Li, Liao, Chun Te, Liao, Chien Mao, Liu, Jerry, Wang, Troy, Levinson, Harry J., Dusa, Mircea V.

Year:

2009

Language:

english

File:

PDF, 817 KB

english, 2009

16

Lithography – Green and Getting Greener

Levinson, Harry J.

Journal:

Japanese Journal of Applied Physics

Year:

2011

Language:

english

File:

PDF, 407 KB

english, 2011

17

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Gridded design rule scaling: taking the CPU toward the 16nm node

Bencher, Christopher, Levinson, Harry J., Dusa, Mircea V., Dai, Huixiong, Chen, Yongmei

Year:

2009

Language:

english

File:

PDF, 4.66 MB

english, 2009

18

Experimental band structure of aluminum

Levinson, Harry J., Greuter, F., Plummer, E. W.

Journal:

Physical Review B

Year:

1983

Language:

english

File:

PDF, 1020 KB

english, 1983

19

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Process-induced defects in sub-0.15-nm device patterning using 193-nm lithography

Okoroanyanwu, Uzodinma, Pike, Christopher, Levinson, Harry J., Sullivan, Neal T.

Year:

2000

Language:

english

File:

PDF, 1.41 MB

english, 2000

20

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Polarization aberration analysis using Pauli-Zernike representation

Yamamoto, Norihiro, Flagello, Donis G., Kye, Jongwook, Levinson, Harry J.

Year:

2007

Language:

english

File:

PDF, 505 KB

english, 2007

21

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Customized illumination shapes for 193nm immersion lithography

Ling, Moh Lung, Chua, Gek Soon, Lin, Qunying, Tay, Cho Jui, Quan, Chenggen, Levinson, Harry J., Dusa, Mircea V.

Year:

2008

Language:

english

File:

PDF, 308 KB

english, 2008

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Optical Microlithography XXII - Process step reduction at negative tone spacer patterning technique using developer soluble bottom ARC

Jung, Woo-Yung, Eom, Jae-Doo, Jeon, Sung-Min, Lee, Ji-Hyun, Lee, Byung-Seok, Kim, Jin-Woong, Levinson, Harry J., Dusa, Mircea V.

Year:

2009

Language:

english

File:

PDF, 1021 KB

english, 2009

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Speckle in optical lithography and the influence on line width roughness

Noordman, Oscar, Levinson, Harry J., Dusa, Mircea V., Tychkov, Andrey, Baselmans, Jan, Tsacoyeanes, James, Politi, Gary, Patra, Michael, Blahnik, Vladan, Maul, Manfred

Year:

2009

Language:

english

File:

PDF, 667 KB

english, 2009

24

The changing psychoanalytic organization and its influence on the ego ideal of psychoanalysis.

Levinson, Harry

Journal:

Psychoanalytic Psychology

Year:

1994

Language:

english

File:

PDF, 1.16 MB

english, 1994

25

Managing Quality Improvement on a Development Pilot Line

Levinson, Harry J., Ben-Jacob, Jake

Journal:

Quality Management Journal

Year:

1996

Language:

english

File:

PDF, 21.49 MB

english, 1996

26

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

Wallow, Thomas, Lin, Qinghuang, Acheta, Alden, Ma, Yuansheng, Pawloski, Adam, Bell, Scott, Ward, Brandon, Tabery, Cyrus, La Fontaine, Bruno, Kim, Ryoung-han, McGowan, Sarah, Levinson, Harry J.

Year:

2007

Language:

english

File:

PDF, 1.08 MB

english, 2007

27

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - A lithographic and process assessment of photoresist stabilization for double-patterning using 172-nm photoresist curing

Henderson, Clifford L., Bekiaris, Nikolaos, Cervera, Hiram, Dai, Junyan, Kim, Ryoung-han, Acheta, Alden, Wallow, Thomas, Kye, Jongwook, Levinson, Harry J., Nowak, Thomas, Yu, James

Year:

2008

Language:

english

File:

PDF, 567 KB

english, 2008

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Scanner OPC signatures: automatic vendor-to-vendor OPE matching

Renwick, Stephen P., Levinson, Harry J., Dusa, Mircea V.

Year:

2009

Language:

english

File:

PDF, 296 KB

english, 2009

29

25. Testing Feasibility/Acceptability and Initial Outcomes of a Spiritually-Based Character Strengths Training Curriculum to Enhance Resilience and Reduce Substance Use Rates Among Zambian Adolescents

Harris, Sion Kim, Seale, Dana, Pande, Yvonne, Lewis, Troy M., Gibson, Erin, Hadfield, Kristin, Levinson, Jordan, Seale, Paul

Journal:

Journal of Adolescent Health

Year:

2020

File:

PDF, 72 KB

2020

30

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Saravanan, Chandra Saru, Archie, Chas N., Nirmalgandhi, Srinivasan, Kritsun, Oleg, Acheta, Alden, Sandberg, Richard, La Fontaine, Bruno, Levinson, Harry J., Lensing, Kevin, Dusa, Mircea, Hauschild, Ja

Year:

2007

Language:

english

File:

PDF, 1.05 MB

english, 2007

31

0404 SYMPTOM OUTCOME SIX MONTHS AFTER ADMISSION TO AN EARLY AFFECTIVE PSYCHOSIS PROGRAM

A.J. Levinson, J. Harris, M. Mathew, K. O'Connor, S. Sokolov, J. Robb, L.T. Young

Journal:

Schizophrenia Research

Year:

2006

Language:

english

File:

PDF, 48 KB

english, 2006

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system

de Jong, Fred, Levinson, Harry J., Dusa, Mircea V., van der Pasch, Bert, Castenmiller, Tom, Vleeming, Bert, Droste, Richard, van de Mast, Frank

Year:

2009

Language:

english

File:

PDF, 1.78 MB

english, 2009

33

THE DRAW-A-DOG SCALE

LEVINSON, BORIS M., MEZEI, HARRY

Journal:

Perceptual and Motor Skills

Year:

1973

Language:

english

File:

PDF, 147 KB

english, 1973

34

SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Optical Microlithography VI - Focus : The Critical Parameter For Submicron Optical Lithography :Part 2

Arnold, William H., Levinson, Harry J., Stover, Harry L.

Year:

1987

Language:

english

File:

PDF, 828 KB

english, 1987

35

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Double exposure using 193nm negative tone photoresist

Kim, Ryoung-han, Flagello, Donis G., Wallow, Tom, Kye, Jongwook, Levinson, Harry J., White, Dave

Year:

2007

Language:

english

File:

PDF, 1.69 MB

english, 2007

36

The surface photoeffect

Levinson, Harry J., Plummer, E. W.

Journal:

Physical Review B

Year:

1981

Language:

english

File:

PDF, 674 KB

english, 1981

37

On becoming an entrepreneur.

Levinson, Harry

Journal:

The Psychologist-Manager Journal

Year:

2000

Language:

english

File:

PDF, 451 KB

english, 2000

38

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - Understanding illumination effects for control of optical proximity effects (OPE)

Flagello, Donis G., Geh, Bernd, Socha, Robert, Liu, Peng, Cao, Yu, Stas, Roland, Natt, Oliver, Zimmermann, Jörg, Levinson, Harry J., Dusa, Mircea V.

Year:

2008

Language:

english

File:

PDF, 461 KB

english, 2008

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - SADP for BEOL using chemical slimming with resist mandrel for beyond 22nm nodes

Jang, Linus, Raghunathan, Sudhar, Ryan, E. Todd, Kye, Jongwook, Levinson, Harry J., Dunn, Shannon, Hetzer, David, Kawakami, Shinichiro, Huli, Lior, Somervell, Mark H., Wallow, Thomas I.

Year:

2012

Language:

english

File:

PDF, 6.57 MB

english, 2012

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Etch aware optical proximity correction: a first step toward integrated pattern engineering

Dunn, D. N., Levinson, Harry J., Dusa, Mircea V., Mansfield, S., Stobert, I., Sarma, C., Lembach, G., Liu, J., Herold, K.

Year:

2009

Language:

english

File:

PDF, 213 KB

english, 2009

41

Cross-national epidemiology of panic disorder and panic attacks in the world mental health surveys

de Jonge, Peter, Roest, Annelieke M., Lim, Carmen C.W., Florescu, Silvia E., Bromet, Evelyn J., Stein, Dan J., Harris, Meredith, Nakov, Vladimir, Caldas-de-Almeida, Jose Miguel, Levinson, Daphna, Al-H

Journal:

Depression and Anxiety

Year:

2016

Language:

english

File:

PDF, 271 KB

english, 2016

42

SELF-CONCEPTS AND IDEAL-SELF CONCEPTS OF RUN-AWAY YOUTHS: COUNSELLING IMPLICATIONS

LEVINSON, BORIS M., MEZEI, HARRY

Journal:

Psychological Reports

Year:

1970

Language:

english

File:

PDF, 123 KB

english, 1970

43

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - 32nm and below logic patterning using optimized illumination and double patterning

Smayling, Michael C., Levinson, Harry J., Dusa, Mircea V., Axelrad, Valery

Year:

2009

Language:

english

File:

PDF, 501 KB

english, 2009

44

What is consultation? That's an interesting question!

Backer, Thomas, Blanton, Judith, Barclay, Alan, Golembiewski, Robert, Kurpius, DeWayne, Levinson, Harry, Perloff, Robert, Leonard, Skipton

Journal:

Consulting Psychology Journal: Practice and Research

Year:

1992

Language:

english

File:

PDF, 980 KB

english, 1992

45

Consulting with family businesses: What to look for, what to look out for

Journal:

Organizational Dynamics

Year:

1983

Language:

english

File:

PDF, 1.10 MB

english, 1983

46

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA, USA (Monday 10 March 1997)] Optical Microlithography X - Minimization of total overlay errors on product wafers using an advanced optimization scheme

Levinson, Harry J., Fuller, Gene E., Preil, Moshe E., Lord, Patrick J.

Year:

1997

Language:

english

File:

PDF, 1.57 MB

english, 1997

47

[IEEE 2012 IEEE Custom Integrated Circuits Conference - CICC 2012 - San Jose, CA, USA (2012.09.9-2012.09.12)] Proceedings of the IEEE 2012 Custom Integrated Circuits Conference - Lithography and design integration — New paradigm for the technology architecture development

Kye, Jongwook, Ma, Yuansheng, Yuan, Lei, Deng, Yunfei, Levinson, Harry

Year:

2012

Language:

english

File:

PDF, 1.15 MB

english, 2012

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - An innovative platform for high-throughput high-accuracy lithography using a single wafer stage

Shibazaki, Yuichi, Levinson, Harry J., Dusa, Mircea V., Kohno, Hirotaka, Hamatani, Masato

Year:

2009

Language:

english

File:

PDF, 4.68 MB

english, 2009

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Polarization aberration control for ArF projection lenses

Matsuyama, Tomoyuki, Levinson, Harry J., Dusa, Mircea V., Kita, Naonori

Year:

2009

Language:

english

File:

PDF, 326 KB

english, 2009

50

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Image-assistant OPC model calibration on 65nm node contact layer

Tsai, Y. Y., Levinson, Harry J., Dusa, Mircea V., Tsai, S. L., Lo, Fred, Yang, Elvis, Yang, T. H., Chen, K. C., Lu, Chih-Yuan

Year:

2009

Language:

english

File:

PDF, 649 KB

english, 2009

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